Product Introduction
This vacuum plasma cleaning machine is designed for industrial mass production. It features a large-capacity vacuum chamber and an industrial-grade RF power supply system, enabling processes such as surface activation, cleaning, etching, and hydrophilicity/hydrophobicity modification on a wide range of materials. Delivering uniform and controllable results without secondary contamination, it is an ideal solution for enhancing product yields in the precision manufacturing industry.
Key Advantages
1. Equipped with an industrial-grade RF power supply for stable, efficient processing that meets mass production requirements.
2. Large-capacity vacuum chamber design supports multi-station processing and integrates seamlessly with automated production lines.
3. Process parameters can be precisely adjusted to meet the treatment requirements of various materials.
4. Features comprehensive safety protection and automated control systems, reducing labor costs.
Application Areas
– Electronics & Semiconductors: Batch cleaning and activation of wafers, PCBs, and chips
– Automotive Manufacturing: Surface treatment of precision components and seals
– Precision Machining: Surface modification of various metal and plastic parts
– New Energy: Surface treatment of battery components and conductive materials
Service Support
We support equipment customization and integration with automated production lines, and offer sample testing, equipment warranties, and professional technical guidance.
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